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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10249472 B1

PDFFull Text
Date of Patent:
Apr. 02, 2019

Filed:

Jul. 13, 2017

Charged particle beam device, charged particle beam influencing device, and method of operating a charged particle beam device

Applicant:

Ict Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh, Heimstetten, DE;

Inventors:

Dieter Winkler, München, DE;

Guy Eytan, Kidron, IL;

Zvi Nir, Karmei Yosef, DE;

Assignee:

ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH, Heimstetten, DE;

Attorney:

Kilpatrick Townsend & Stockton LLP

Primary Examiner:

David A Vanore

Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/21 (2006.01); H01J 37/145 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/145 (2013.01); H01J 37/09 (2013.01); H01J 37/1477 (2013.01); H01J 37/21 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24475 (2013.01);
Abstract

A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis (A); an aperture device with a first number of apertures configured to create a first number of beamlets from the charged particle beam, wherein the first number is five or more, wherein the apertures are arranged on a ring line around the optical axis (A) such that perpendiculars of the apertures onto a tangent of the ring line are evenly spaced. The charged particle beam device further includes an electrostatic multipole device configured to individually influence the beamlets. Further, a charged particle beam influencing device and a method of operating a charged particle beam device are described.

Find Patent Forward Citations

Winkler, Dieter. (2019). Charged particle beam device, charged particle beam influencing device, and method of operating a charged particle beam device (U.S. Patent No. 10249472). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10249472

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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