The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Apr. 03, 2018
Brigham Young University (Byu), Provo, UT (US);
Thomas W. Sederberg, Orem, UT (US);
Xin Li, Hefei, CN;
Brigham Young University, Provo, UT (US);
Abstract
Techniques of refining a model of a complex surface can include deriving a set of refinement rules based on eigen polyhedra in a plane. Such rules reduce the refinement of a mesh in the plane to a scale and translation of the eigen polyhedron. Such refinement rules may then be applied to a non-uniform mesh in three-dimensional space having an extraordinary point in place of conventional refinement rules used in Catmull-Clark surfaces or NURBS surfaces. When these refinement rules are applied to a non-uniform mesh having an extraordinary point, the limiting surface is Gat the extraordinary point, i.e., the tangent surfaces of the limiting mesh are continuous at the extraordinary point.