The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2019

Filed:

Nov. 21, 2016
Applicant:

Asml Holding N.v., Veldhoven, NL;

Inventor:

Kirill Urievich Sobolev, Brookfield, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G02B 27/00 (2006.01); G02B 21/02 (2006.01); G01B 9/02 (2006.01); G01B 11/27 (2006.01); G02B 17/02 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0025 (2013.01); G01B 9/02058 (2013.01); G01B 11/272 (2013.01); G02B 17/026 (2013.01); G02B 21/02 (2013.01); G03F 7/70141 (2013.01); G03F 9/7049 (2013.01);
Abstract

An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.


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