The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2019

Filed:

Mar. 28, 2014
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takahiro Asai, Kawasaki, JP;

Kaoru Ishikawa, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); H01M 4/04 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); H01M 4/13 (2010.01); B05D 1/32 (2006.01); H01M 10/0525 (2010.01); H01M 6/40 (2006.01); H01M 4/139 (2010.01); H01M 4/66 (2006.01);
U.S. Cl.
CPC ...
H01M 4/0404 (2013.01); B05D 1/322 (2013.01); G03F 7/023 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/40 (2013.01); H01M 4/0414 (2013.01); H01M 4/13 (2013.01); H01M 6/40 (2013.01); H01M 10/0525 (2013.01); H01M 4/139 (2013.01); H01M 4/661 (2013.01); Y10T 428/24322 (2015.01);
Abstract

A method for forming a pattern, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n≥2) are formed on a support, includes forming a first resist layer on the support surface; and repeating: forming a guide hole through a kth resist layer by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, removing the kth resist layer, and forming a (k+1)th resist layer on the support and all pattern materials, regarding kth (k=1 to n−1) pattern material and resist layer in order of k=1 to n−1; forming a guide hole and nth pattern material filling similarly, and removing the nth resist layer.


Find Patent Forward Citations

Asai, Takahiro. (2019). Method for forming pattern, structural body, method for producing comb-shaped electrode, and secondary cell (U.S. Patent No. 10243198). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10243198

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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