The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Feb. 16, 2016
Asml Netherlands B.v., Veldhoven, NL;
Günes Nakiboglu, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load, and wherein the phase change material is stationary relative to the projection system during critical operations of the lithography apparatus.