The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2019

Filed:

Jul. 14, 2017
Applicant:

Infineon Technologies Americas Corp., El Segundo, CA (US);

Inventor:

Hugo Burke, Cardiff, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); H01L 23/522 (2006.01); H01L 23/31 (2006.01); H01L 23/00 (2006.01); H01L 29/76 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5222 (2013.01); H01L 23/3171 (2013.01); H01L 23/5226 (2013.01); H01L 23/5329 (2013.01); H01L 23/562 (2013.01); H01L 29/76 (2013.01); H01L 23/53295 (2013.01);
Abstract

A semiconductor device includes a crack propagation prevention structure. The crack propagation prevention structure is located at an edge region of a wiring layer stack located on a semiconductor substrate of the semiconductor device. Furthermore, the crack propagation prevention structure laterally surrounds at least one wiring structure located within the wiring layer stack. Additionally, the semiconductor device includes an insulation trench extending into the semiconductor substrate. The insulation trench comprises at least an insulation layer electrically insulating the crack propagation prevention structure from the semiconductor substrate. The crack propagation prevention structure extends vertically at least from a surface of the wiring layer stack to the insulation trench.


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