The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2019
Filed:
Mar. 15, 2016
Raytheon Company, Waltham, MA (US);
Sean P. Kilcoyne, Lompoc, CA (US);
Robert M. Emerson, Solvang, CA (US);
Michael V. Liguori, Beullton, CA (US);
Raytheon Company, Waltham, MA (US);
Abstract
Systems and methods of in-situ calibration of semiconductor material layer deposition and removal processes are disclosed. Sets of test structures including one or more calibration vias or posts are used to precisely monitor processes such as plating and polishing, respectively. Known (e.g., empirically determined) relationships between the test structure features and product feature enable monitoring of wafer processing progress. Optical inspection of the calibration feature(s) during processing cycles permits dynamic operating condition adjustments and precise cessation of processing when desired product feature characteristics have been achieved.