The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2019
Filed:
Jun. 16, 2016
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); G05D 7/06 (2006.01); G01F 1/684 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); C23C 16/455 (2013.01); C23C 16/45561 (2013.01); G01F 1/684 (2013.01); G05D 7/0635 (2013.01); H01J 37/32009 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32834 (2013.01); H01L 21/67017 (2013.01); H01L 21/67253 (2013.01); H01J 2237/334 (2013.01); H01L 21/31116 (2013.01);
Abstract
Throughput of the processing can be improved. A gas supply system includes a plurality of element devices which constitute the gas supply system and a baseon which the plurality of element devices are disposed. Some of the element devices are disposed on a surfaceof the base, and the others are disposed on a surfaceof the base, which is opposite to the surfaceof the base. The plurality of element devices may be implemented by, for example, a flow rate controller FD and a secondary valve FV. The secondary valve FVis disposed on the surface, which is opposite to the surfaceof the basewhere the flow rate controller FD is disposed.