The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Jul. 10, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jeffrey C. Maling, Grand Isle, VT (US);

Anthony K. Stamper, Burlington, VT (US);

Dana R. DeReus, Santa Ana, CA (US);

Arthur S. Morris, III, Raleigh, NC (US);

Assignees:

INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);

WISPRY, INC., Irvine, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B81B 3/00 (2006.01); B81C 1/00 (2006.01); H01H 1/00 (2006.01); H01L 23/34 (2006.01); H01L 29/84 (2006.01);
U.S. Cl.
CPC ...
B81B 3/0072 (2013.01); B81C 1/00333 (2013.01); B81C 1/00825 (2013.01); H01L 23/34 (2013.01); H01L 29/84 (2013.01); B81B 2201/018 (2013.01); B81B 2203/0118 (2013.01); B81C 2203/0136 (2013.01); B81C 2203/0145 (2013.01); H01H 1/0036 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are disclosed. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity. The method for forming the cavity further includes forming at least one first vent hole of a first dimension which is sized to avoid or minimize material deposition on a beam structure during sealing processes. The method for forming the cavity further includes forming at least one second vent hole of a second dimension, larger than the first dimension.


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