The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Feb. 25, 2016
Asml Netherlands B.v., Veldhoven, NL;
Theodorus Wilhelmus Polet, Grave, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Jimmy Matheus Wilhelmus Van De Winkel, Kessel, NL;
Gregory Martin Mason Corcoran, Eindhoven, NL;
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.