The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Sep. 18, 2014
Asml Netherlands B.v., Veldhoven, NL;
Chuangxin Zhao, Eindhoven, NL;
Sander Baltussen, Castenray, NL;
Pär Mårten Lukas Broman, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Cristian Bogdan Craus, Helmond, NL;
Jan Groenewold, Castricum, NL;
Dzmitry Labetski, Eindhoven, NL;
Kerim Nadir, Eindhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Christian Felix Wählisch, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.