The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2019

Filed:

Jun. 17, 2017
Applicant:

Renesas Electronics Corporation, Koutou-ku, Tokyo, JP;

Inventors:

Yoshiyuki Kawashima, Tokyo, JP;

Masao Inoue, Tokyo, JP;

Atsushi Yoshitomi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 29/792 (2006.01); H01L 29/49 (2006.01); H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 29/78 (2006.01); H01L 27/1157 (2017.01); H01L 27/11573 (2017.01);
U.S. Cl.
CPC ...
H01L 29/792 (2013.01); H01L 21/28282 (2013.01); H01L 27/1157 (2013.01); H01L 27/11573 (2013.01); H01L 29/42344 (2013.01); H01L 29/42376 (2013.01); H01L 29/4966 (2013.01); H01L 29/66545 (2013.01); H01L 29/66833 (2013.01); H01L 29/785 (2013.01);
Abstract

A memory cell includes a control gate electrode and a memory gate electrode. The control gate electrode is formed over the upper surface and the sidewall of a fin FA including apart of a semiconductor substrate. The memory gate electrode is formed over one side surface of the control gate electrode and the upper surface and the sidewall of the fin through an ONO film, in a position adjacent to the one side surface of the control gate electrode. Further, the control gate electrode and the memory gate electrode are formed of n-type polycrystalline silicon. A first metal film is provided between the gate electrode and the control gate electrode. A second metal film is provided between the ONO film and the memory gate electrode. A work function of the first metal film is greater than a work function of the second metal film.


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