The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Oct. 28, 2016
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Niyaz Khusnatdinov, Round Rock, TX (US);
Dwayne L. LaBrake, Cedar Park, TX (US);
Assignee:
CANON KABUSHIKI KAISHA, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 21/3065 (2006.01); H01L 21/768 (2006.01); B81C 1/00 (2006.01); H01L 21/027 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0273 (2013.01); B81C 1/00611 (2013.01); H01L 21/28194 (2013.01); H01L 21/3081 (2013.01); H01L 21/3085 (2013.01); H01L 21/3086 (2013.01); H01L 21/30604 (2013.01); H01L 21/30655 (2013.01); H01L 21/7684 (2013.01); B81C 2201/0118 (2013.01); B81C 2201/0121 (2013.01); B81C 2201/0126 (2013.01); H01L 21/31116 (2013.01); H01L 21/31138 (2013.01);
Abstract
Methods of reversing the tone of a pattern having non-uniformly sized features. The methods include depositing a highly conformal hard mask layer over the patterned layer with a non-planar protective coating and etch schemes for minimizing critical dimension variations.