The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Jul. 28, 2017
Method for measuring resolution of charged particle beam and charged particle beam drawing apparatus
Nuflare Technology, Inc., Yokohama-shi, JP;
Yukitaka Shimizu, Yokohama, JP;
NuFlare Technology, Inc., Yokohama-shi, JP;
Abstract
In one embodiment, a method for measuring a resolution of a charged particle beam includes changing a focus position of the charged particle beam in a height direction, and scanning a dot mark formed on a substrate with the charged particle beam for each focus position, detecting a reflected charged particle reflected from the dot mark for each focus position, calculating a scattered charged particle distribution from a detection result of the reflected charged particle for each height corresponding to the focus position, performing a convolution operation on an approximate expression of a beam waveform of the charged particle beam and a mark shape of the dot mark, the approximate expression including an aperture angle and a resolution of the charged particle beam as parameters, and calculating the aperture angle and the resolution by fitting the scattered charged particle distribution by height and a calculation result of the convolution operation.