The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Mar. 23, 2016
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Aksel Goehnermeier, Essingen-Lauterburg, DE;
Gisela Von Blanckenhagen, Aalen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A multilayer mirror for reflecting extreme ultraviolet (EUV) radiation, the mirror has a substrate and a stack of layers formed on the substrate. The stack of layers comprises layers including a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength λ. The mirror provides a first peak of reflectivity of 20% or more at a first wavelength λin a first wavelength band extending from 6 nm to 7 nm and a second peak of reflectivity of 20% or more at a second wavelength λin a second wavelength band extending from 12.5 nm to 15 nm.