The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Mar. 06, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01B 11/24 (2013.01); G03F 7/7085 (2013.01); G03F 7/70191 (2013.01); G03F 7/70633 (2013.01);
Abstract
A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.