The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2019

Filed:

Apr. 13, 2012
Applicants:

Bayard K. Johnson, Jefferson Hills, PA (US);

John P. Deluca, Chesterfield, MO (US);

William L. Luter, St. Charles, MO (US);

Inventors:

Bayard K. Johnson, Jefferson Hills, PA (US);

John P. Deluca, Chesterfield, MO (US);

William L. Luter, St. Charles, MO (US);

Assignee:

GTAT IP HOLDING LLC, Hudson, NH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C30B 15/04 (2006.01); C30B 29/06 (2006.01); C30B 15/12 (2006.01); H01L 31/18 (2006.01); C30B 15/00 (2006.01);
U.S. Cl.
CPC ...
C30B 15/04 (2013.01); C30B 15/002 (2013.01); C30B 15/12 (2013.01); C30B 29/06 (2013.01); H01L 31/182 (2013.01); Y02E 10/546 (2013.01); Y02P 70/521 (2015.11); Y10T 117/1052 (2015.01); Y10T 117/1056 (2015.01);
Abstract

A Czochralski growth system is disclosed comprising a crucible, a silicon delivery system comprising a feeder having a delivery point overhanging the crucible and delivering a controllable amount of silicon into the crucible, and at least one doping mechanism controllably delivering at least one dopant material to the feeder. The system can comprise two or more doping mechanisms each loaded with a different dopant material and can therefore be used to prepare silicon ingots having multiple dopants. The resulting ingots have substantially constant dopant concentrations along their axes. Also disclosed is a method of Czochralski growth of at least one silicon ingot comprising at least one dopant material, which is preferably a continuous Czochralski method.


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