The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2019
Filed:
Mar. 31, 2017
Applicant:
Evatec Ag, Trubbach, CH;
Inventors:
Sven Uwe Rieschl, Malans, CH;
Juergen Weichart, Balzers, LI;
Assignee:
EVATEC AG, Trübbach, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/351 (2013.01); C23C 14/3407 (2013.01); C23C 14/3485 (2013.01); C23C 14/3492 (2013.01); C23C 14/35 (2013.01); H01J 37/3405 (2013.01); H01J 37/3426 (2013.01); H01J 37/3455 (2013.01); H01J 37/3467 (2013.01);
Abstract
So as to control the operation of a sputter target during the lifetime of the target and under HIPIMS operation, part of a magnet arrangement associated to the target is retracted from the target whereas a second part II of the magnet arrangement is, if at all, retracted less from the addressed backside during the lifetime of the target. Thereby, part I is closer to the periphery of target than part II, as both are eccentrically rotated about a rotational axis.