The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Oct. 19, 2016
Applicant:

Ememory Technology Inc., Hsinchu, TW;

Inventor:

Te-Hsun Hsu, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 29/423 (2006.01); G11C 16/04 (2006.01); H01L 27/11524 (2017.01); H01L 27/11519 (2017.01); G11C 16/10 (2006.01); G11C 17/16 (2006.01); G11C 17/18 (2006.01); H01L 27/112 (2006.01); G11C 16/08 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11524 (2013.01); G11C 16/0425 (2013.01); G11C 16/0433 (2013.01); G11C 16/10 (2013.01); G11C 17/16 (2013.01); G11C 17/18 (2013.01); H01L 27/11206 (2013.01); H01L 27/11519 (2013.01); H01L 29/42328 (2013.01); H01L 29/7881 (2013.01); G11C 16/08 (2013.01);
Abstract

A non-volatile memory including following elements is provided. The floating gate transistor, the select transistor and the stress-releasing transistor are disposed on the substrate and coupled in series with each other. The stress-releasing transistor is located between the floating gate transistor and the select transistor. The stress-releasing transistor has a stress release ratio represented by formula (1). A lower limit value of the stress release ratio is determined by a sustainable drain side voltage of the stress-releasing transistor of the non-volatile memory which is unselected when a program operation is performed. An upper limit value of the stress release ratio is determined by a readable drain current of the non-volatile memory which is selected when a read operation is performed.The stress release ratio=a channel length of the stress-releasing transistor/a gate dielectric layer thickness of the stress-releasing transistor  (1).


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