The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Apr. 10, 2017
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventor:

Chin-Cheng Yang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); H01L 27/105 (2006.01); H01L 23/532 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5283 (2013.01); H01L 21/0217 (2013.01); H01L 21/02164 (2013.01); H01L 21/31144 (2013.01); H01L 21/76895 (2013.01); H01L 23/53295 (2013.01); H01L 27/1052 (2013.01);
Abstract

An edge structure for multiple layers of devices including stacked multiple unit layers includes first and second stair structures. The first stair structure is at a first direction of the devices where device contacts are formed, including first edge portions of the unit layers at the first direction, of which the borders gradually retreat with increase of level height. The elevation angle from the border of the first edge portion of the bottom unit layer to that of the top one is a first angle. The second stair structure includes second edge portions of the unit layers at a second direction. The variation of border position of the second edge portion with increase of level height is irregular. The elevation angle from the border of the second edge portion of the bottom unit layer to that of the top one is a second angle larger than the first angle.


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