The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Jul. 27, 2017
Applicants:

Air Liquide Advanced Materials, Inc., Branchburg, NJ (US);

L'air Liquide, Société Anonyme Pour L;etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;

Air Liquide Advanced Materials Llc, Branchburg, PA (US);

Inventors:

Antonio Sanchez, Tsukuba, JP;

Gennadiy Itov, Flemington, NJ (US);

Reno Pesaresi, Easton, PA (US);

Jean-Marc Girard, Versailles, FR;

Peng Zhang, Montvale, NJ (US);

Manish Khandelwal, Somerset, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C07F 7/10 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02211 (2013.01); C07F 7/10 (2013.01); C23C 16/345 (2013.01); C23C 16/402 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/02274 (2013.01); H01L 21/02222 (2013.01);
Abstract

Si-containing film forming compositions comprising Si—C free and volatile silazane-containing precursors are disclosed. The compositions may be used to deposit high purity thin films. The Si—C free and volatile silazane-containing precursors have the formulae:[(SiR)NSiH]—NH—C≡N, with=1 or 2;  (a)[(SiR)NSiH]—NL,with=2 or 3;  (b)(SiH)NSiH—O—SiHN(SiH); and  (c)(SiR')N—SiH—N(SiR′);  (d)with each R independently selected from H, a dialkylamino group, or an amidinate; each R′ independently selected from H, a dialkylamino group, or an amidinate, with the provision that all R′ are not H; and L is selected from H or a C-Chydrocarbyl group.

Published as:
US2017323783A1; WO2018107138A1; TW201829830A; US10192734B2; CN110036139A; KR20190093597A; JP2020507199A; CN110036139B; TWI791477B; KR102511289B1;

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