The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
May. 04, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/20 (2006.01); G03F 1/20 (2012.01); G03F 1/22 (2012.01); C08F 212/14 (2006.01); C08F 12/32 (2006.01); C08F 12/20 (2006.01); C08F 12/22 (2006.01); C09D 125/18 (2006.01); C08F 12/24 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 12/22 (2013.01); C08F 12/24 (2013.01); C08F 12/32 (2013.01); C08F 212/14 (2013.01); C09D 125/18 (2013.01); G03F 1/20 (2013.01); G03F 1/22 (2013.01); G03F 7/0045 (2013.01); G03F 7/0048 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C08F 12/20 (2013.01);
Abstract
A polymer comprising recurring units derived from vinylanthraquinone, recurring units derived from acid labile group-substituted hydroxystyrene, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a positive resist composition having a high resolution and minimal LER.