The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
Jul. 12, 2016
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Jong Won Shon, Seoul, KR;
Dae Youn Kim, Daejeon, KR;
Sang Don Lee, Yongin-si, KR;
Hyun Soo Jang, Daejeon, KR;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/4401 (2013.01); C23C 16/45544 (2013.01); C23C 16/5096 (2013.01); H01J 37/3244 (2013.01); H01J 37/32458 (2013.01); H01J 37/32568 (2013.01); H01J 37/32715 (2013.01); H01J 37/32834 (2013.01);
Abstract
A deposition apparatus includes: a substrate support having a main surface on which a substrate is placed; a body disposed on the main surface and including a hollow portion having an exposed upper portion; a plasma electrode unit provided at a inner circumferential surface of the body to separate the hollow portion into an upper space and a lower space; and a gas supply unit supplying process gas to the plasma electrode unit, wherein a gas exhaust channel extending from the lower space to an exhaust outlet provided at a top of the body is formed in the body.
Published as:
US2017044665A1; TW201706443A; CN106435525A; KR20170019975A; TWI643976B; US10190214B2; CN106435525B; KR102417930B1;