The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2019

Filed:

Jun. 27, 2017
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Matthias Kuenle, Villach, AT;

Daniel Schloegl, Villach, AT;

Hans-Joachim Schulze, Taufkirchen, DE;

Christoph Weiss, Munich, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/36 (2006.01); H01L 29/78 (2006.01); H01L 29/739 (2006.01); H01L 29/861 (2006.01); H01L 29/10 (2006.01); H01L 29/08 (2006.01); H01L 21/265 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/36 (2013.01); H01L 21/265 (2013.01); H01L 29/0804 (2013.01); H01L 29/0882 (2013.01); H01L 29/1095 (2013.01); H01L 29/6609 (2013.01); H01L 29/66325 (2013.01); H01L 29/66674 (2013.01); H01L 29/7393 (2013.01); H01L 29/7801 (2013.01); H01L 29/861 (2013.01);
Abstract

A power semiconductor device has a semiconductor body configured to conduct a load current in parallel to an extension direction between first and second load terminals of the power semiconductor device. The semiconductor body includes a doped contact region electrically connected to the second load terminal, a doped drift region having a dopant concentration that is smaller than a dopant concentration of the contact region, and an epitaxially grown doped transition region separated from the second load terminal by the contact region and that couples the contact region to the drift region. An upper subregion of the transition region is in contact with the drift region, and a lower subregion of the transition region is in contact with the contact region. The transition region has a dopant concentration of at least 0.5*10cmfor at least 5% of the total extension of the transition region in the extension direction.


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