The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Sep. 28, 2016
Hitachi High-tech Science Corporation, Minato-ku, Tokyo, JP;
Masahiro Kiyohara, Tokyo, JP;
Kengo Takeno, Tokyo, JP;
Atsushi Uemoto, Tokyo, JP;
Kaoru Umemura, Tokyo, JP;
Abstract
A sample positioning method that can easily and quickly position a target observation area of a sample, which is disposed on a sample stage in a sample chamber of a charged particle beam apparatus, into a field of view of a first charged particle beam. The method includes displaying an image including the sample on a display screen; designating an attention point on the basis of the image on the display screen while maintaining the relative position of the attention point with respect to the sample stage; aligning the position of the sample stage in the direction of an optical axis so that the attention point is positioned in an on-axis point tracer plane perpendicular to the optical axis through an on-axis target point on the optical axis; moving the attention point to the on-axis target point by performing detection of deviation of the attention point from the on-axis target point and movement in the on-axis point tracer plane; and moving the attention point into a depth of focus of a charged particle beam optics.