The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2019

Filed:

Nov. 27, 2016
Applicant:

Silicon Storage Technology, Inc., San Jose, CA (US);

Inventors:

Hieu Van Tran, San Jose, CA (US);

Anh Ly, San Jose, CA (US);

Thuan Vu, San Jose, CA (US);

Hung Quoc Nguyen, Fremont, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 16/30 (2006.01); G11C 16/14 (2006.01); G11C 16/04 (2006.01); G11C 16/08 (2006.01); G11C 5/14 (2006.01); G11C 8/08 (2006.01); G11C 16/10 (2006.01); G11C 16/16 (2006.01); G11C 16/26 (2006.01); H01L 27/11521 (2017.01);
U.S. Cl.
CPC ...
G11C 16/30 (2013.01); G11C 5/14 (2013.01); G11C 5/145 (2013.01); G11C 5/147 (2013.01); G11C 8/08 (2013.01); G11C 16/0408 (2013.01); G11C 16/0425 (2013.01); G11C 16/08 (2013.01); G11C 16/10 (2013.01); G11C 16/14 (2013.01); G11C 16/16 (2013.01); G11C 16/26 (2013.01); H01L 27/11521 (2013.01); G11C 2216/04 (2013.01);
Abstract

A non-volatile memory device comprises a semiconductor substrate of a first conductivity type. An array of non-volatile memory cells is located in the semiconductor substrate and arranged in a plurality of rows and columns. Each memory cell comprises a first region on a surface of the semiconductor substrate of a second conductivity type, and a second region on the surface of the semiconductor substrate of the second conductivity type. A channel region is between the first region and the second region. A word line overlies a first portion of the channel region and is insulated therefrom, and adjacent to the first region and having little or no overlap with the first region. A floating gate overlies a second portion of the channel region, is adjacent to the first portion, and is insulated therefrom and is adjacent to the second region. A coupling gate overlies the floating gate. A bit line is connected to the first region. During the operations of program, read, or erase, a negative voltage can be applied to the word lines and/or coupling gates of the selected or unselected memory cells.


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