The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2019

Filed:

Sep. 15, 2017
Applicant:

Infineon Technologies Austria Ag, Villach, DE;

Inventors:

Matteo Dainese, Villach, AT;

Erich Griebl, Dorfen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/74 (2006.01); H01L 31/111 (2006.01); H01L 29/739 (2006.01); H01L 21/027 (2006.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H01L 21/308 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/36 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7397 (2013.01); H01L 21/0273 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 21/3086 (2013.01); H01L 29/0615 (2013.01); H01L 29/0684 (2013.01); H01L 29/0804 (2013.01); H01L 29/0821 (2013.01); H01L 29/1004 (2013.01); H01L 29/1095 (2013.01); H01L 29/36 (2013.01); H01L 29/41708 (2013.01); H01L 29/4236 (2013.01); H01L 29/66348 (2013.01);
Abstract

A semiconductor device includes a semiconductor body including a base region and two semiconductor mesas separated from each other by an insulated trench gate structure extending from a first side into the base region, and including a dielectric layer separating a gate electrode from the semiconductor body. Each semiconductor mesa includes, in a cross-section perpendicular to the first side, a body region forming a pn-junction with the base region, a latch-up-safety region of the same conductivity type as the body region arranged between the body region and the first side, and having a higher doping concentration than the body region, and an emitter region between the dielectric layer and the latch-up-safety region and forming a pn-junction with the body region. At least one semiconductor mesa includes an emitter contact arranged between the emitter region and the latch-up-safety region and forming with the latch-up-safety and emitter regions an Ohmic contact.


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