The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2019

Filed:

Nov. 30, 2016
Applicant:

Stmicroelectronics (Tours) Sas, Tours, FR;

Inventors:

Frédéric Lanois, Tours, FR;

Alexei Ankoudinov, Redwood, WA (US);

Vladimir Rodov, Seattle, WA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02M 3/158 (2006.01); H01L 29/06 (2006.01); H01L 29/861 (2006.01); H01L 29/10 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 27/06 (2006.01); H01L 27/092 (2006.01);
U.S. Cl.
CPC ...
H01L 29/063 (2013.01); H01L 27/0629 (2013.01); H01L 29/1095 (2013.01); H01L 29/42364 (2013.01); H01L 29/7802 (2013.01); H01L 29/861 (2013.01); H02M 3/158 (2013.01); H01L 27/0922 (2013.01);
Abstract

A diode includes upper and lower electrodes and first and second N-type doped semiconductor substrate portions connected to the lower electrode. A first vertical transistor and a second transistor are formed in the first portion and series-connected between the electrodes. The gate of the first transistor is N-type doped and coupled to the upper electrode. The second transistor has a P channel and has a P-type doped gate. First and second doped areas of the second conductivity type are located in the second portion and are separated by a substrate portion topped with another N-type doped gate. The first doped area is coupled to the gate of the second transistor. The second doped area and the other gate are coupled to the upper electrode.


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