The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2019

Filed:

Nov. 24, 2015
Applicant:

Rambus Inc., Sunnyvale, CA (US);

Inventors:

David Geoffrey Stork, Portola Valley, CA (US);

Mehjabin Sultana Monjur, Evanston, IL (US);

Leonidas Spinoulas, Chicago, IL (US);

Patrick R. Gill, Sunnyvale, CA (US);

Assignee:

Rambus Inc., Sunnyvale, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G02B 27/42 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1876 (2013.01); G02B 27/4255 (2013.01);
Abstract

Described are imaging systems that employ diffractive structures as focusing optics optimized to detect visual edges (e.g., slits or bars). The diffractive structures produce edge responses that are relatively insensitive to wavelength, and can thus be used to precisely measure edge position for panchromatic sources over a wide angle of view. Simple image processing can improve measurement precision. Field-angle measurements can be made without the aid of lenses, or the concomitant cost, bulk, and complexity.


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