The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Jul. 16, 2015
Seoul National University R&db Foundation, Seoul, KR;
Seoul National University R&DB Foundation, Seoul, KR;
Abstract
A method of manufacturing a nano membrane structure includes preparing a temporary structure having a substrate in which a through-hole is formed in a central portion, and a nano membrane including silicon nitride (SiN), that covers the through-hole on the substrate, and including a central area formed on the through-hole, and a peripheral area formed on the substrate. The method includes preparing an insulating support member including at least one of silicon and a compound containing silicon, and in which a micropore is formed in a central portion, forming a complex structure by performing a hydrophilic surface processing of a surface of the nano membrane and one surface of the insulating support member and by bonding the temporary structure and the insulating support member so that at least a portion of the central area of the nano membrane and the micropore face, and removing the substrate from the complex structure.