The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2019

Filed:

Oct. 13, 2015
Applicant:

Rudolph Technologies, Inc., Flanders, NJ (US);

Inventors:

Jian Ding, Hackettstown, NJ (US);

Priya Mukundhan, Lake Hopatcong, NJ (US);

James Kane, Sparta, NJ (US);

Steven Peterson, Blairstown, NJ (US);

Fei Shen, Budd Lake, NJ (US);

Assignee:

Rudolph Technologies, Inc., Wilmington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); B08B 7/04 (2006.01); H01L 21/02 (2006.01); G01D 18/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0057 (2013.01); G01D 18/00 (2013.01); H01L 21/02046 (2013.01); H01L 21/67028 (2013.01); H01L 21/67115 (2013.01); H01L 21/67288 (2013.01);
Abstract

A method of cleaning calibration and other substrates that improves the correlation of measurements from calibration and product substrates and increases the useful life of the calibration substrates is herein disclosed. By exposing a calibration substrate to ultraviolet light, a reaction is triggered that results in the cleaning of the contaminants from the calibration substrate. For instance, monatomic oxygen is introduced to contaminants on the surface of a calibration substrate to remove the contaminants without inducing modifications in the substrate itself. Through the cleaning process, the temperature of the calibration substrate may be controlled to limit adverse effects caused by the overheating of the calibration substrate.


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