The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 2019

Filed:

Mar. 27, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Kathryn C. Fisher, Tempe, AZ (US);

Qiang Huang, Sleepy Hollow, NY (US);

Satyavolu S. Papa Rao, Poughkeepsie, NY (US);

David L. Rath, Stormville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0216 (2014.01); H01L 31/02 (2006.01); H01L 31/0224 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02168 (2013.01); H01L 31/0201 (2013.01); H01L 31/0216 (2013.01); H01L 31/02167 (2013.01); H01L 31/022425 (2013.01); H01L 31/022433 (2013.01); H01L 31/18 (2013.01); H01L 31/1864 (2013.01); Y02E 10/50 (2013.01);
Abstract

A photovoltaic device is provided that includes a semiconductor substrate including a p-n junction with a p-type semiconductor portion and an n-type semiconductor portion one lying on top of the other, wherein an upper exposed surface of the semiconductor substrate represents a front side surface of the semiconductor substrate. A plurality of patterned antireflective coatings is located on the front side surface to provide a grid pattern including a busbar region and finger regions. The busbar region includes at least a real line interposed between at least two dummy lines. A material stack including at least one metal layer located on the semiconductor substrate in the busbar region and the finger regions.


Find Patent Forward Citations

Loading…