The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Feb. 15, 2017
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Daniel J. Dechene, Wappingers Falls, NY (US);
Geng Han, Wappingers Falls, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/11 (2006.01); H01L 21/033 (2006.01); H01L 27/02 (2006.01); H01L 27/118 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01L 27/0207 (2013.01); H01L 27/1104 (2013.01); H01L 27/11803 (2013.01);
Abstract
A multiple exposure patterning process includes the incorporation of a dummy feature into the integration flow. The dummy feature, which is placed to overlie an existing masking layer and thus does not alter the printed image, improves the critical dimension uniformity (CDU) of main critical (non-dummy) features at the same masking level.
Dechene, Daniel. (2019). Dummy pattern addition to improve cd uniformity (U.S. Patent No. 10170309). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10170309
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile