The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Nov. 07, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Wenbo Yan, Sunnyvale, CA (US);
Cong Trinh, Santa Clara, CA (US);
Ning Li, San Jose, CA (US);
Victor Nguyen, Novato, CA (US);
Mihaela Balseanu, Sunnyvale, CA (US);
Li-Qun Xia, Cupertino, CA (US);
Mark Saly, Santa Clara, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02164 (2013.01); C23C 16/402 (2013.01); C23C 16/45542 (2013.01); C23C 16/45551 (2013.01); C23C 16/45553 (2013.01); H01L 21/0228 (2013.01); H01L 21/0234 (2013.01); H01L 21/02219 (2013.01); H01L 21/02274 (2013.01); H01L 21/02348 (2013.01); G05B 2219/45031 (2013.01); G05B 2219/45232 (2013.01); H01L 21/68764 (2013.01);
Abstract
Processes for depositing SiOfilms on a wafer surface utilizing an aminosilane compound as a silicon precursor are described.