The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2018

Filed:

Jan. 18, 2017
Applicant:

Altek Semiconductor Corp., Hsinchu, TW;

Inventors:

Shuo-Tse Hung, Hsinchu, TW;

Yun-Chin Li, Hsinchu, TW;

Wen-Yan Chang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 13/00 (2018.01); H04N 13/128 (2018.01); H04N 13/156 (2018.01);
U.S. Cl.
CPC ...
H04N 13/128 (2018.05); H04N 13/156 (2018.05);
Abstract

An optimization method of image depth information and an image processing apparatus are provided. A to-be-repaired depth map generated based on a left image and a right image is obtained. A superpixel segmenting process is performed on the left image or the right image to obtain multiple superpixels. A plurality of image segments are obtained by aggregating the superpixels according to pixel information in the superpixels. A hole filling process is performed on holes of the to-be-repaired depth map to obtain a hole-filled depth map. A statistical analysis is performed on first valid depth values of the to-be-repaired depth map and second valid depth values of the hole-filled depth map to obtain a plurality of optimized depth values by using the ranges of the image segments, the ranges of the superpixels, the to-be-repaired depth map, and the hole-filled depth map.


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