The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Jun. 27, 2016
Young Chang Chemical Co., Ltd, Seongju-gun, Gyeongsangbuk-do, KR;
Seung Hun Lee, Daegu, KR;
Seung Hyun Lee, Daegu, KR;
Sang Woong Yoon, Seoul, KR;
Su Jin Lee, Daegu, KR;
Young Cheol Choi, Gumi-si Gyeongsangbuk-do, KR;
YOUNG CHANG CHEMICAL CO., LTD, Seongju-gun, Gyeongsangbuk-do, KR;
Abstract
Provided is a negative photoresist composition for a KrF laser for semiconductor pattern formation, which includes a predetermined compound in order to improve the properties of a conventional negative photoresist, thereby realizing high transparency, high resolution and an excellent profile, even in the presence of an exposure source having a short wavelength compared to the conventional negative photoresist, and is thus suitable for use in semiconductor processing.