Method of examining locations in a wafer with adjustable navigation accuracy and system thereof

Abstract

A method, computerized system and computer program product for examining an object using a processor operatively connected to a memory, the method comprising: accommodating in the memory data indicative of a plurality of alignment targets, each alignment target associated with a target location on an object; accommodating in the memory a plurality of locations to be captured; and selecting by the processor an alignment target subset of the plurality of alignment targets, such that each of the plurality of locations is associated with and is within a determined distance from a single alignment target from the alignment target subset, the distance determined in accordance with a provided field of view, and wherein the alignment target subset comprises fewer targets than locations to be reviewed, the alignment target being usable for aligning the object relative to an examination tool for capturing the locations associated with the single alignment target.