The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2018

Filed:

Mar. 31, 2016
Applicant:

Toyota Jidosha Kabushiki Kaisha, Toyota-shi, Aichi-ken, JP;

Inventors:

Yuki Sato, Nisshin, JP;

Motoki Hiraoka, Toyota, JP;

Hiroshi Yanagimoto, Myoshi, JP;

Hiroki Usui, Toyota, JP;

Assignee:

TOYOTA JIDOSHA KABUSHIKI KAISHA, Toyota-shi, Aichi-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C25F 3/00 (2006.01); C25D 5/08 (2006.01); C25D 3/00 (2006.01); H05K 3/00 (2006.01); C25D 5/02 (2006.01); C25D 7/00 (2006.01); C25D 17/00 (2006.01); C25D 17/12 (2006.01); C25D 21/10 (2006.01); C25F 3/02 (2006.01); C25F 7/00 (2006.01); C23C 18/16 (2006.01); C23C 18/30 (2006.01);
U.S. Cl.
CPC ...
C25D 5/08 (2013.01); C25D 3/00 (2013.01); C25D 5/02 (2013.01); C25D 7/00 (2013.01); C25D 17/00 (2013.01); C25D 17/005 (2013.01); C25D 17/12 (2013.01); C25D 21/10 (2013.01); C25F 3/02 (2013.01); C25F 7/00 (2013.01); H05K 3/00 (2013.01); C23C 18/1605 (2013.01); C23C 18/30 (2013.01);
Abstract

A method of forming a wiring pattern includes: a) forming a metal underlayer including a first underlying wiring layer which is in contact with an electrode, a second underlying wiring layer which is not in contact with the electrode, and an underlying connection layer which connects the first underlying wiring layer to the second underlying wiring layer; b) forming a metal plating layer on the metal underlayer through electroplating; and c) removing a metal connection portion through etching. The metal connection portion is the underlying connection layer covered with the metal plating layer. The etching includes bringing a solid electrolyte material that contains a solution into which metal of the metal connection portion is dissolved, into contact with the metal connection portion and applying a voltage between the metal connection portion and the solid electrolyte material.


Find Patent Forward Citations

Loading…