The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2018
Filed:
Nov. 14, 2017
Globalfoundries Inc., Grand Cayman, KY;
Laertis Economikos, Wappingers Falls, NY (US);
Chanro Park, Clifton Park, NY (US);
Ruilong Xie, Schenectady, NY (US);
Pei Liu, Clifton Park, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
The disclosure relates to methods including: forming a soft mask; forming a first marking trench within a portion of the soft mask by selectively removing a portion of the soft mask at a first location, over one of a pair of gate trenches; forming an insulative liner on the soft mask and within the first marking trench; forming an anti-reflective film on the insulative liner and within the first marking trench; selectively removing the anti-reflective film and the insulative liner at a second location to expose a portion of the soft mask positioned over the other one of the pair of gate trenches; forming a second marking trench by removing another portion of the soft mask at the second location; and removing a portion of the soft mask at the first and second marking trenches to expose a lower surface of each of the pair of gate trenches.