The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2018

Filed:

Jul. 21, 2015
Applicants:

Ias Inc., Tokyo, JP;

Shin-etsu Handotai Co., Ltd., Tokyo, JP;

Inventors:

Katsuhiko Kawabata, Tokyo, JP;

Tatsuya Ichinose, Tokyo, JP;

Toshihiko Imai, Fukushima, JP;

Assignees:

IAS, INC., Tokyo, JP;

SHIN_ETSU HANDOTAI CO., LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/62 (2006.01); G01N 1/28 (2006.01); G01N 35/10 (2006.01); G01N 1/00 (2006.01); B01L 3/02 (2006.01); G01N 1/32 (2006.01); H01J 49/04 (2006.01); H01J 49/10 (2006.01);
U.S. Cl.
CPC ...
G01N 27/62 (2013.01); B01L 3/021 (2013.01); B01L 3/0262 (2013.01); B01L 3/0293 (2013.01); G01N 1/00 (2013.01); G01N 1/28 (2013.01); G01N 1/32 (2013.01); G01N 35/10 (2013.01); G01N 35/1002 (2013.01); G01N 35/1016 (2013.01); G01N 35/1095 (2013.01); B01L 2200/0684 (2013.01); B01L 2200/082 (2013.01); H01J 49/045 (2013.01); H01J 49/105 (2013.01);
Abstract

An object of the present invention is to provide an analysis apparatus in which local analysis of a substrate with ICP-MS is automated. The present invention relates to an automatic analysis apparatus for a local region of a substrate, including: a nozzle for local analysis having: analysis-liquid supply means that ejects analysis liquid onto a substrate; analysis-liquid discharge means that takes the analysis liquid including an object to be analyzed from the substrate into the nozzle to feed the analysis liquid to a nebulizer; and exhaust means including an exhaust channel in the nozzle; automatic liquid-feed means that automatically feeds the collected analysis liquid to ICP-MS; flow adjustment means that adjusts the flow of the analysis liquid; and automatic control means that simultaneously performs local analysis and analysis of the object to be analyzed with the ICP-MS to perform automatic analysis to a plurality of adjacent predetermined regions, successively.


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