The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2018

Filed:

Mar. 16, 2016
Applicant:

Nuflare Technology, Inc., Kanagawa, JP;

Inventors:

Yasushi Iyechika, Chiba, JP;

Masato Akita, Kanagawa, JP;

Assignee:

NuFlare Technology, Inc., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 5/10 (2006.01); G01J 5/08 (2006.01); C23C 16/52 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
G01J 5/10 (2013.01); C23C 16/4584 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); G01J 5/0896 (2013.01);
Abstract

A film forming apparatus includes: a support, a rotator, a gas supplier, and a radiation thermometer configured to measure a temperature of a surface of a substrate, wherein the radiation thermometer includes: a light source of an irradiation light to be irradiated to the surface of the substrate; a first light receiver configured to receive a reflected light from a first measurement region at a predetermined distance from the rotation center on the surface of the substrate; and a second light receiver configured to receive a heat radiation light from a second measurement region extending in a rotation direction of the substrate at the predetermined distance from the rotation center on the surface of the substrate.


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