The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2018

Filed:

Feb. 19, 2016
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Kuan-Liang Liu, Hsinchu County, TW;

Shih-Yin Hsiao, Chiayi County, TW;

Ching-Chung Yang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66598 (2013.01); H01L 21/26513 (2013.01); H01L 29/7833 (2013.01);
Abstract

A method of fabricating a transistor with reduced hot carrier injection effects includes providing a substrate covered by a gate material layer. Later, the gate material layer is patterned into a gate electrode. Then, a mask layer is formed to cover part of the gate electrode and expose two ends of the gate electrode. Finally, a first implantation process is performed to implant dopants through the exposed two ends of the gate electrode into the substrate directly under the gate electrode to form two LDD regions by taking the mask layer as a mask.


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