The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2018

Filed:

Jul. 01, 2016
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Amit Shahar, Sunnyvale, CA (US);

Chia-Hsun Lee, Santa Clara, CA (US);

Robert L. Davies, Fremont, CA (US);

Sterling Orsten, Santa Clara, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/042 (2006.01); G06F 3/01 (2006.01); G06T 5/30 (2006.01); G06T 5/00 (2006.01); G06T 7/00 (2017.01); G06F 3/00 (2006.01); G06F 3/03 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0421 (2013.01); G06F 3/005 (2013.01); G06F 3/017 (2013.01); G06F 3/0304 (2013.01); G06T 5/003 (2013.01); G06T 5/30 (2013.01); G06T 7/0075 (2013.01); G06F 2203/04101 (2013.01); G06F 2203/04105 (2013.01); G06T 2207/10021 (2013.01); G06T 2207/10048 (2013.01);
Abstract

Systems, apparatuses, and/or methods to characterize a user feature. For example, and apparatus may include a pattern receiver to receive a feature infrared (IR) pattern corresponding to non-uniform IR radiation reflected by skin of the user feature and an object IR pattern corresponding to IR radiation reflected by an object. The apparatus may further include a filter to generate a modified IR pattern from the object IR pattern and to remove at least a part of the modified IR pattern from feature IR pattern. In addition, the apparatus may include a feature characterizer to characterize the user feature based on the feature IR pattern. In one example, a computing platform may be controlled based on the characterization of the user feature.


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