The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 2018

Filed:

May. 13, 2014
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Yong Jai Cho, Daejeon, KR;

Won Chegal, Daejeon, KR;

Hyun Mo Cho, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01J 4/00 (2006.01); G01J 4/04 (2006.01);
U.S. Cl.
CPC ...
G01N 21/211 (2013.01); G01J 4/00 (2013.01); G01J 4/04 (2013.01); G01J 2004/001 (2013.01); G01N 2021/213 (2013.01); G01N 2201/0683 (2013.01); G01N 2201/11 (2013.01);
Abstract

Provided is an optical element rotation type Mueller-matrix ellipsometer for solving a problem of measurement accuracy and measurement precision occurring due to residual polarization of a light source, polarization dependence of a photo-detector, measurement values of Fourier coefficients of a high order term in dual optical element rotation type Mueller-matrix ellipsometers according to the related art capable of measuring some or all of components of a Mueller-matrix for any sample.


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