The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Mar. 29, 2016
Sunedison Semiconductor Limited (Uen201334164h), Singapore, SG;
Arash Abedijaberi, St. Charles, MO (US);
John A. Pitney, St. Peters, MO (US);
Shawn George Thomas, Chesterfield, MO (US);
GlobalWafers Co., Ltd., Hsinchu, TW;
Abstract
A system for depositing a layer on a substrate includes a processing chamber including a gas inlet, a plurality of gas flow controllers connected in fluid communication with a gas supply source, a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate. The gas distribution plate defines a plurality of holes, and the gas injection cap defines a plurality of gas flow passages, each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate. Each of the gas flow controllers is disposed proximate to the gas injection cap.