The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Feb. 04, 2016
Versum Materials Us, Llc, Tempe, AZ (US);
Haripin Chandra, San Marcos, CA (US);
Kirk Scott Cuthill, Vista, CA (US);
Anupama Mallikarjunan, San Marcos, CA (US);
Xinjian Lei, Vista, CA (US);
Matthew R. MacDonald, Laguna Niguel, CA (US);
Manchao Xiao, San Diego, CA (US);
Madhukar Bhaskara Rao, Carlsbad, CA (US);
Jianheng Li, Santa Clara, CA (US);
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Abstract
Described herein are compositions and methods using same for forming a silicon-containing film such as, without limitation, a carbon doped silicon oxide film, a carbon doped silicon nitride, a carbon doped silicon oxynitride film in a deposition process. In one aspect, the composition comprises at least cyclic carbosilane having at least one Si—C—Si linkage and at least one anchoring group selected from a halide atom, an amino group, and combinations thereof.