The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Mar. 29, 2016
Applicant:

Ushio Denki Kabushiki Kaisha, Tokyo, JP;

Inventors:

Yusuke Teramoto, Gotenba, JP;

Hideyuki Urakami, Himeji, JP;

Akihisa Nagano, Gotenba, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); H05G 2/005 (2013.01);
Abstract

An extreme ultraviolet light source device includes two discharge electrodes, two plasma raw material containers associated with the discharge electrodes, respectively, and two supply units associated with the containers, respectively. The supply units supply the plasma raw materials from the containers onto the discharge electrodes upon rotations of the discharge electrodes. The light source device also includes an energy beam irradiating unit configured to irradiate the plasma raw material on a circumferential surface of one of the discharge electrodes with an energy beam to vaporize the plasma raw material such that electric discharge takes place between the discharge electrodes to generate the plasma. The light source device also includes two film thickness regulating units associated with the discharge electrodes, respectively. Each film thickness regulating unit is configured to regulate a thickness of the plasma raw material on the circumferential surface of the associated discharge electrode to a predetermined film thickness.


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