The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Feb. 25, 2015
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Masashi Itonaga, Kumamoto, JP;

Masanobu Watanabe, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); C23C 16/448 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); H01L 21/67017 (2013.01); C23C 16/4481 (2013.01); C23C 16/4482 (2013.01); C23C 16/56 (2013.01); H01L 21/0201 (2013.01); H01L 21/02656 (2013.01);
Abstract

The present disclosure provides an apparatus for generating a processing gas by bubbling a raw material liquid with a carrier gas. The processing gas generated by the bubbling is taken out from a vapor-phase portion above a liquid-phase portion of the raw material liquid through a taking-out unit. A first temperature adjusting unit performs a temperature adjustment of the liquid-phase portion and a second temperature adjusting unit performs a temperature adjustment of the vapor-phase portion such that the temperature of the vapor-phase portion is higher than the temperature of the liquid-phase portion.


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