The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2018
Filed:
May. 13, 2015
Asml Netherlands B.v., Veldhoven, NL;
Johannes Jacobus Matheus Baselmans, Veldhoven, NL;
Hans Butler, Veldhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Sander Kerssemakers, Veldhoven, NL;
Bart Smeets, Veldhoven, NL;
Robertus Nicodemus Jacobus Van Ballegoij, Veldhoven, NL;
Hubertus Petrus Leonardus Henrica Van Bussel, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.