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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10134617 B1

PDFFull Text
Expired
Date of Patent:
Nov. 20, 2018

Filed:

Dec. 26, 2014

Wafer carrier having thermal cover for chemical vapor deposition systems

Applicant:

Veeco Instruments, Inc, Plainview, NY (US);

Inventors:

Alexander I. Gurary, Bridgewater, NJ (US);

Eric Armour, Plainview, NY (US);

Assignee:

Veeco Instruments Inc., Plainview, NY (US);

Attorney:

Patterson Thuente Pedersen, P.A.

Primary Examiner:

Sylvia MacArthur

Int. Cl.
CPC ...
H01L 21/673 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67333 (2013.01); C23C 16/4584 (2013.01); C23C 16/46 (2013.01); H01L 21/68735 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); Y10T 29/49826 (2015.01); Y10T 29/49837 (2015.01);
Abstract

The invention relates generally to semiconductor fabrication technology and, more particularly, to chemical vapor deposition (CVD) processing and associated apparatus for addressing temperature non-uniformities on semiconductor wafer surfaces. Embodiments include a wafer carrier for use in a system for growing epitaxial layers on one or more wafers by CVD, the wafer carrier comprising a top plate and base plate which function coordinately to reduce temperature variability caused during CVD processing.

Published as:
US2015187620A1; WO2015100437A1; TW201530690A; US10134617B2; TWI650832B; US2019157125A1;

Find Patent Forward Citations

Gurary, Alexander. (2018). Wafer carrier having thermal cover for chemical vapor deposition systems (U.S. Patent No. 10134617). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10134617

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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