The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Dec. 26, 2014
Applicant:
Veeco Instruments, Inc, Plainview, NY (US);
Inventors:
Alexander I. Gurary, Bridgewater, NJ (US);
Eric Armour, Plainview, NY (US);
Assignee:
Veeco Instruments Inc., Plainview, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67333 (2013.01); C23C 16/4584 (2013.01); C23C 16/46 (2013.01); H01L 21/68735 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); Y10T 29/49826 (2015.01); Y10T 29/49837 (2015.01);
Abstract
The invention relates generally to semiconductor fabrication technology and, more particularly, to chemical vapor deposition (CVD) processing and associated apparatus for addressing temperature non-uniformities on semiconductor wafer surfaces. Embodiments include a wafer carrier for use in a system for growing epitaxial layers on one or more wafers by CVD, the wafer carrier comprising a top plate and base plate which function coordinately to reduce temperature variability caused during CVD processing.
Published as: